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S2. Advanced Materials & Process Technology

Wednesday, February 11 | 1:00 pm - 5:30 pm
#308

Architecting the Angstrom Era: A New Paradigm in Materials and Processes

 

This session will highlight cutting-edge research and development in advanced materials and process technologies as the foundational architects of the Angstrom era. Prominent presenters from global research institutes and industries will share their insights on three focused themes: memory, equipment and materials, and BEOL. The eight exceptional presentations, including visionary invited talks from imec and IBM, will address major technical challenges and deliver transformative solutions for the next generation of computing by exploring AI-driven materials advances, atomic-level process control, and innovative interconnect technology to overcome physical scaling limits. 

 

  • Date: Feb 11(Wed), 2026
  • Time: 13:00-17:30
  • Room: 308, Conference Room (South), 3F, COEX
  • Language: English (Simultaneous interpretation will NOT be provided.)
  • Registration Fee (KRW)
    • Early Bird: SEMI Members 198,000 / Non-members 275,000 / Student 132,000
    • Onsite: 330,000

 

Committee

  • Andy Kim (Lam Research Korea)
  • Hyungsub Kim (Sungkyunkwan University)
  • Hyoung-Yoon Kim (DB HiTek )
  • Seungwook Ryu (SK hynix)
  • Ki-Seon Park (SK Materials)
  • Jeonghoon Park (Tokyo Electron Korea)
  • Jin-Seong Park (Hanyang University)
  • Hyun-Chul Sohn (Yonsei University)
  • Won-Jun Lee (Sejong University)
  • Chang-won Lee (Merck)
  • Ho-Chang Lee (Applied Materials Korea)
  • In-Gon Lim (A-PRO)
  • Hanjin Lim (Samsung Electronics) 

Agenda

Advanced embedded memory technology for generative AI development at the edge

Gouri Sankar Kar (invited)

imec
1:00 pm - 1:40 pm

Technical Challenges for 3D-NAND Extension

Jinho Oh

SK hynix
1:40 pm - 2:05 pm

Break

2:05 pm - 2:25 pm

Accelerating Semiconductor Roadmaps: The Role of AI-Driven

Ron Pearlstein

Merck
2:25 pm - 2:50 pm

Architecting Epitaxial Precision for Advanced Node Scaling

Yi-Chiau Huang

Applied Materials
2:50 pm - 3:15 pm

Applications of Ion Implantation Technology for Scaling Down Advanced Devices

KyungWon Lee

Axcelis Technologies
3:15 pm - 3:40 pm

Break

3:40 pm - 4:00 pm

Challenges and Innovations in Advanced Interconnect Metallization

Juhyun Kim

Samsung Electronics
4:00 pm - 4:25 pm

Engineering Capacitance Reduction in Advanced Logic and Memory Technology

Erik A Edelberg

Lam Research
4:25 pm - 4:50 pm

Advanced Logic Technology as a Backbone of the New Era of Computing

Kisik Choi (Invited)

IBM
4:50 pm - 5:30 pm

*The agenda is subject to change.

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