Compound Power Semiconductor Summit
Wednesday, February 11 | 1:00 pm - 4:40 pm
#403
- Date: Feb 11(Wed), 2026
- Time: 13:00-16:40
- Room: 403, Conference Room (South), 4F, COEX
- Language: English and Korean (Simultaneous interpretation will NOT be provided.)
- Registration Fee (KRW)
- Early Bird: SEMI Members 198,000 / Non-members 275,000 / Student 132,000
- Onsite: 330,000
Compound Power Semiconductor Summit is the premier event dedicated to exploring the latest technological advancements, industry trends, and market outlooks in Wide Band Gap (WBG) materials, specifically SiC, GaN, and Ga₂O₃.
Key Focus: SiC Value Chain & System Integration
This year's agenda is curated to cover the entire SiC value chain, from manufacturing (single crystal, epi-wafer, ion implantation) to high-performance power system integration (devices and modules).
Attendees will gain deep insights into critical areas, including:
- Market & Technology Trends: Overview of the Power Semiconductor Landscape.
- SiC Epitaxy Innovation: Reducing Surface Defects via Improved In-Situ Etching.
- Advanced Manufacturing: 8-inch SiC Epitaxial Technology in China and Ga₂O₃ Single Crystal Growth Technology for Next-Generation Power Semiconductor.
- Equipment Technology: The Latest Equipment Technologies for SiC Ion Implantation and Tunable Epi Systems (SiC, GaN HEMT)
- Performance & Evaluation: High-Power Semiconductor Evaluation Methods.
Co-organized by ![]()
Agenda
The Reduction of Surface Defect of SiC Epitaxy by Improved in-situ Etching Process
Han Seok Seo
Research Institute of Industrial Science & Technology
1:30 pm - 2:00 pm
8 inch SiC Epitaxial Technology and Industrial Application
Larkin Kong
Hangzhou Haiqian Semiconductor
2:00 pm - 2:30 pm
Current Status of Ga₂O₃ Single Crystal Growth Technology for Next-Generation Power Semiconductor Applications
Jinki Kang
AXEL
2:30 pm - 3:00 pm
High Power Semiconductor Markets and Evaluation Method
Hyemin Kang
Korea Institute of Energy Technology(KENTECH)
3:10 pm - 3:40 pm
*The agenda is subject to change.