T5. CMP & Cleaning Tutorial

2026-02-12 | 오후 2:00 - 오후 5:00
#308

This tutorial aims to provide a basic course for new engineers who are working at CMP & Cleaning technology related area. We expect you will learn the fundamental technologies in CMP & Cleaning process from academia. 

 

  • Date: Feb 12(Thu), 2026
  • Time: 14:00-17:00
  • Room: 308, Conference Room (South), 3F, COEX
  • Language: Korean (Simultaneous interpretation will NOT be provided.)
  • Registration Fee (KRW)
    • Early Bird: SEMI Members 132,000 / Non-members 176,000 / Student 66,000
    • Onsite: 220,000

Agenda

CMP Fundamentals for 3D Integration

Prof. Taesung Kim

Sungkyunkwan University
오후 2:00 - 오후 3:15
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Q&A / Break

오후 3:15 - 오후 3:30
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Understanding of Particle Removal and Surface Preparation for 3D Integration Era

Prof. Tae-Gon Kim

Hanyang University
오후 3:30 - 오후 4:45
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Q&A

오후 4:45 - 오후 5:00
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* The agenda is subject to change.