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Fundamentals of EUV Lithography

11:00 am - 11:50 am

EUV 노광기술은 이미 로직 소자 뿐만 아니라 DRAM 소자의 양산에 적용되고 있지만 해상도의 확보 이외에도 생산성의 향상 및 패턴 결함의 저감을 위한 다양한 기술개발이 진행되고 있다. 본 강좌에서는 노광에서 해상도를 개선하는 기본원리로부터 시작하여 EUV 노광장치의 구조, EUV 마스크의 특성, EUV 펠리클의 요구특성, EUV 레지스트의 감광 특성 등을 설명한다. 또한 조만간 다가올 high-NA EUV 노광기술에 적용되는 신기술도 간단히 소개한다. 본 강연은 EUV 리소그라피 공정을 시작하려는 분들에게 도움이 될 수 있도록 준비될 것이다.

Featured Speakers

Jinho Ahn

Prof. Jinho Ahn

Professor Hanyang University

Jinho Ahn worked for Microelectronics Research Laboratory at NEC, Tsukuba, Japan (1993 – 1995), and joined Hanyang University in 1995 as a professor of Materials Science and Engineering. He has been a leader of several national projects for advanced lithography. He has authored over 160 technical papers and invented more than 45 patents. His major research fields are Nano Patterning Technologies (EUV Lithography, Nano Imprint, Soft Lithography) and Next Generation Memories.

He worked as a Director of Nano and Convergence Technology at National Research Foundation of Korea, and the Vice President of Academic Research/ President of Industry-University Cooperation Foundation at Hanyang University. He also served as the Director for international Collaboration at Consortium of Semiconductor Advanced Research.  He is now a member of the National Academy of Engineering of Korea, and a board member of National Nano Infrastructure Association and National R&D Information Management Committee. He is contributing to the professional society as a Program Committee Chair for Nano Korea, Scientific Committee Chair at Korea Nano Technology Society, and Organizing Committee Member at EUVL Symposium/EUVL Workshop/ International MNC.