Jong Chul Park

~1992 : Bachelor’s degree, Kyung Buk national university, Electrical & Electronic Engineering

  Then I had studied semiconductor device operation including Tr. Characteristics mainly and fabrication process for 2 years.

~1999 : Master’s & Ph.D’s degree, POSTECH university, Electrical & Electronic Engineering

  For 7 years I had studied and issued some technical papers on plasma sources and plasma processes. The Plasma sources include CCP source and Helical resonator ICP source, and the plasma processes include dry etching and CVD.

~Now : Master director, Dry etching team, DS division, Samsung elec.

  Starting to develop DRAM fabrication process including Tr. Integration and implementation with dry etching technology for 12 years and I lead new memory fabrication team for 5 years. And then I changed my career to Logic Foundry business to develop the new technology for logic chips.