Hyo Seon Suh

Hyo Seon Suh, Ph.D., joined imec as a researcher in 2017 with a focus on the implementation of directed self-assembly (DSA) processes in high volume manufacturing (HVM). His key contribution was to control and stabilize the defectivity of the DSA process. Since 2020, Suh has been leading the R&D team in the advanced patterning department, where the team is focused on developing patterning materials, including EUV resist, underlayer, and other ancillary materials. Suh and his team are collaborating with various industry and academia partners to conduct industry-relevant research.

Before joining imec, Suh was a postdoctoral fellow at the University of Wisconsin-Madison, the University of Chicago, and Argonne National Laboratory in the USA. He received his PhD degree in the Interdisciplinary Program of Nano-science and Technology in 2011 from Seoul National University in South Korea. Suh obtained a bachelor’s degree with honors in Chemical and Biological Engineering in 2005 from the same university. Throughout his academic career, Suh studied self-assembly of block copolymer thin films for nanofabrication applications, which is the foundation of his current R&D activities.