Sangsul Lee

Sangsul Lee is a scientist at the Pohang Accelerator Laboratory and a professor in the Department of Semiconductor Engineering at POSTECH, Korea. He is also a lecturer for the EUV Lithography course at SPIE Advanced Lithography. He has led projects on compact EUV synchrotron-based light sources and infrastructure development, focusing on EUV lithography and actinic metrology. His research is driven by synchrotron-enabled cutting-edge science and applies advanced metrology and characterization techniques to EUV-relevant materials and processes, including mask, pellicle, and photoresist evaluation. In parallel, he investigates non-destructive nanoscale 3D metrology to support advanced semiconductor manufacturing and process readiness. He also explores next-generation lithography such as High-NA EUV and shorter-wavelength lithography, while collaborating with industry partners to translate frontier EUV research into practical technology solutions.