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Manufacturing AI Solutions for Engineering Automation

1:30 pm - 1:55 pm

In semiconductor manufacturing, back-end processes have become a critical determinant of overall competitiveness. As process environments grow more integrated and complex and quality requirements tighten, conventional post-hoc, engineer-centered analysis based on equipment alarms and log data is reaching its limits for yield and productivity enhancement. In this context, AI-driven decision making, grounded in high-fidelity data from back-end operations, emerges as a key enabler of substantive innovation. 

A robust data foundation is essential for such AI deployment. This requires data-platform–based pipelines for large-scale data collection and integration, ontology management, and access to deep equipment data. Back grinders, dicers, bonders, molding tools, and test equipment generate millisecond-level, high-volume IoT data, including vibration, current, temperature, pressure, and positional signals. Systematic acquisition, cleansing, and feature engineering of these signals are indispensable for early detection of chip cracks, voids, bonding defects, and other latent failure modes. However, transmitting all raw IoT data to centralized servers imposes significant latency, network, and security burdens, motivating an edge-computing architecture in which data preprocessing and first-stage analytics are performed near the equipment, and only semantically enriched information is forwarded upstream. 

Meaningful AI innovation further arises from integrating these real-time edge data streams with historical information in legacy systems such as MES, RMS, EAP, and SPC. When long-term records of recipes, lot histories, maintenance logs, and defect analyses are jointly modeled with edge-level sensor data, AI systems can move beyond simple anomaly detection to learn recurrent failure patterns tied to specific process and equipment conditions, enabling advanced process optimization and predictive maintenance. We argue that the future competitiveness of semiconductor back-end manufacturing will depend on the convergence of three capabilities: (1) an IoT-based high-quality data infrastructure, (2) edge-computing support for real-time, large-scale data processing, and (3) an AI-driven, end-to-end process-optimization architecture tightly integrated with existing legacy systems, providing a practical pathway toward Autonomous Manufacturing Fabs that continuously learn and self-optimize. 

Featured Speakers

Kichul Yang

Ki Chul Yang

Senior Director, BISTelligence

Ki Chul Yang is Senior Director of Product Business at BISTelligence, where he oversees the strategy and development of AI edge based advanced analytics solutions for semiconductor manufacturing. Over his 28-year career spanning process engineering, equipment engineering, APC/FDC, and MES, he has led a wide range of initiatives that apply AI/ML, digital twin technologies, predictive maintenance, and yield-optimization frameworks across complex wafer fabrication and back-end packaging operations. Combining deep domain expertise with rigorous data-driven methodologies, he focuses on building high-speed, high-volume AI edge solutions that analyze real-time equipment data and IoT signals and seamlessly integrate with existing legacy systems, thereby enabling smarter, more autonomous, and highly efficient semiconductor fabs.