Hoki Lee
PL, Samsung Electronics
PERSONAL INFORMATIONS
- Name : HOKI Lee
- Date of Birth : 21. June 1976
- Nationality : Rep. of KOREA
- Marital Status : married with three children
EDUCATION
[2004]
- POSTECH, Pohang-si, Kyungbuk-do, Korea
- M.A. in Chemical Engineering
- Thesis: “WNx thin film deposition using diffusion barrier against Cu”
[2002]
- YONSEI University, SEOUL, Korea
- B.A. in Chemical Engineering
EXPERIENCE
Semiconductor R&D Center, Samsung electronics, Hwasung, Korea
- PL (Project Leader), etch process development for flash Memory (12/2021-Current)
- Visiting Scholar, University of Maryland, college Park, MD,USA (01/2017-01/2018)
- Principal Engineer, developed dry-etching process in Flash Memory (03/2017-Current)
- Senior Engineer, developed dry-etching process in flash memory. (03/2010-02/2017)
- Engineer, developed Dry etching Process in Memory Device (06/2008-02/2010)
- Engineer, developed CVD process in Memory Device (02/2004-05/2008)