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Poster Session & MI Forum Reception

12:00 pm - 2:00 pm
  • Date: Feb 12(Thu), 2026
  • Time: 12:00-14:00
  • Room: 402 Lobby, Conference Room (South), 4F, COEX
  • Language: English and Korean
  • Simultaneous interpretation will NOT be provided.

 

 

Posters

 

Early Detection of Process Window Shifts in ALD processes by Ultra-High Aspect Ratio Test Structures 

Mikko Utriainen | Chipmetrics 

 

High Sensitivity and Low Cost of Ownership Glass Carrier Inspection and UV Transmittance for Applications in Thinned Wafer Processing 

Jason Lin | Onto Innovation 

 

Automated Workflow Integration for Semiconductor Failure Analysis Using CAD Navigation and AI-Based Image Analysis 

Changeun Lee | Synopsys 

 

Quantitative Hydrogen Analysis by Time of Flight-Elastic Recoil Detection Analysis (TOF-ERDA) using Medium Energy Ion 

Won Ja Min | HB Solution 

 

Atomic Force Microscopy Characterization for Hybrid Bonding Interface Optimization 

Daeho Kim | Bruker 

 

AI & HBM Contact Solution, M-POGO 

Eunsang Lee | LUKEN Technolgies 

 

High-Resolution UV-Based Defect Inspection System for Advanced Packaging and Hybrid Bonding 

Yong-Woon Lim | Nextin 

 

AFM Characterization of Sidewall and Critical Dimensions in Photonic and Power Devices 

Seung Yeon Sung | Park Systems 

 

 

Committee 

  • Christopher H. Kang (Thermo Fisher Scientific)
  • MinKeun Kwak (Auros Technology)
  • Sungsu Kim (KLA)
  • TK Kim (HICS Company)
  • Yong Jun Park (Samsung Display)
  • Minsuk Seo (Camtek)
  • Yudong Soe (Onto Innovation)
  • Chaeho Shin (KRISS)
  • Kyu-Chan Shim (SK hynix)
  • Youn Tae Ahn (LUKEN Technologies)
  • Jeongho Ahn (Samsung Electronics)
  • Kyung-Bae Hwang (ASML)
  • Hyungwon Yoo (Hitachi High-Technologies)
  • DaeHa Lee (AMETEK Korea)
  • Dongchun Lee (Park Systems)
  • Myungjun Lee (Samsung Electronics)
  • Byoung-Ho Lee (Hitachi High-Technologies)
  • Yong-Woon Lim (Nextin)
  • Mansoo Jang (Applied Materials)
  • Sanghyun Han (NOVA) 

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