Guy Vereecke, Ph.D. joined the Ultra Clean Processing group of the Interuniversity Microelectronics Center (imec) in 1993, where he is now a senior researcher in the Surface and Interface Processing group. He is author or co-author of more than 100 journal papers, 150 conference presentations, 5 book chapters, and 8 patents on surface analysis, gas phase corrosion and contamination, vapor phase cleaning, UV-assisted cleaning, laser cleaning, megasonic cleaning of nano-particles and damaging of structured wafers, post-CMP cleaning, and wet strip and characterization of post-etch photoresist and residues. His current research topics are in wet processing of high aspect ratio nano-structures (wetting, cleaning, etching and drying).
Guy Vereecke received a M.S. degree and a Ph.D. degree in Materials Sciences from the Université Catholique de Louvain (UCL), Louvain-La-Neuve, Belgium.
본 연사의 발표는 S5. Contamination-free Manufacturing and CMP Technology(STS) 에서 볼 수 있습니다.