S1. Advanced Lithography

Room #307, COEX Wednesday, January 31
1:00pm to 5:00pm

Language: English (Simultaneous interpretation will NOT be provided)


  SEMI 회원사 비회원사 학생
사전등록(2/1까지) 150,000 원 180,000 원 80,000 원
현장등록 180,000 원 200,000 원 100,000 원


Advanced Lithography session of the STS 2017 will offer the opportunities to review the recent trends in the main stream lithography technologies under the theme of "Readiness of EUV or Alternative".

As EUV is expected to enter the manufacturing phase in near future, it will be a perfect opportunity to check the overall readiness and progress of EUV technology in practical aspects. Prominent leading researchers in the industry will present the up-to-date progress and readiness of EUV technology in each area of expertise, which include resist, mask, OPC, scanner, track, and wafer process integration. Remaining critical issues will be assessed also accordingly. Though EUV gets the upper hand nowadays, still other technologies are very active and show good progress. Therefore, this session will cover the update of the latest progress on alternative technologies such as nano imprint, directed self-assembly and computational lithography as well.


  • Shangwon Kim (Dongbu HiTek)
  • Seong-Sue Kim (Samsung Electronics)
  • Jaehyun Kim (Dongjin Semichem)
  • Hong Seok Kim (Toppan Photomasks Korea)
  • Chang-Nam Ahn (ASML Korea)
  • Hye-Keun Oh (Hanyang University)
  • Changmoon Lim (SK hynix)
  • Jaesung Choi (ASML Korea)


13:00-13:20 EUV Lithography Industrialization Progress
  Sung-Woo Lee, ASML
13:20-14:00 The EUVL Marathon: Getting Across the Finish Line
  Harry J. Levinson, GLOBALFOUNDRIES (invited)
14:00-14:20 EUV Mask Progress and Readiness
  Toshio Konishi, Toppan Printing
14:20-14:40 Novel EUV Resist Development for Sub-7 nm Node
  Takehiko Naruoka, JSR Micro
14:40-15:00 Break
15:00-15:20 EUV Materials for Sub 20nm Patterning
  Shiyong Yi, Samsung Electronics
15:20-15:40 Advanced Technology for Sub-10nm Patterning
  Naoki Inagaki, Tokyo Electron
15:40-16:00 Assessment of EUV Lithography Progress for EUV HVM Introduction
  Yoonsuk Hyun, SK hynix
16:00-16:20 Break
16:20-16:40 Advanced Computation Lithography and Lithography-aware Design for 10nm Beyond
  Ki-Ho Baik, Synopsys
16:40-17:20 Nanoimprint Lithography Performance for Advanced Semiconductor Manufacturing
  Soichi Inoue, Toshiba (invited)
17:20-18:00 Directed Self-Assembly of Block Copolymers: Potential Applications and Direction
  Geert Vandenberghe, imec (invited)

*상기 일정은 사전 안내 없이 변경될 수 있습니다.

* 발표 자료는 당일 컨퍼런스 종료 후 사이트를 통해 배포됩니다 (연사가 동의하지 않는 경우는 배포되지 않음).

Co-Sponsored by: 
Share page with AddThis