Koji Kita, Ph.D. has been an associate professor in the Department of Materials Engineering, the University of Tokyo since 2010, as a principal investigator in functional ultrathin film engineering research group. Currently his research is mainly focused on the design of dielectric properties of metal oxide thin films for the gate stacks, and design of device processes to control the properties of dielectric/semiconductor interfaces for wide bandgap semiconductor devices.
Prior to the current position, Kita had been in the Department of Materials Engineering, the University of Tokyo for 9 years as a lecturer and an assistant Professor.
Kita received a Ph. D. degree and Master’s degree in chemical engineering, from the University of Tokyo, Bunkyo-ku, Tokyo, Japan. He is a member of Japanese Society of Applied Physics, IEEE, and the Electrochemical Society.