Sidney Huey has been directly involved with and responsible for CMP product and process development for over 20 years at Applied Materials. He started as a systems/process engineer developing key products such the 200mm Mirra® and 300mm Reflexion® CMP platforms, Titan® CMP polishing heads and a variety of advanced process control products. He has worked collaboratively with logic, foundry and memory device makers solving industries leading CMP challenges such as edge die yield, planarization efficiency and consumable performance stability and predictability. Currently, he is leading the CMP Product Marketing group and working with customers to understand their current and future issues. From this interaction, he is driving development teams on creating solutions to enable device manufacturers to realize their next generation devices in terms of both performance and economics.
Prior to joining Applied Materials, Huey was a principal researcher in the area of combustion for Sandia National Laboratories in Livermore, CA. During his 3 years at Sandia, he focused on combustion of renewable energy source.
Huey received a Master’s degree in Mechanical Engineering with an emphasis on combustion from Princeton University, Princeton, NJ, USA and a Bachelor’s degree in Mechanical Engineering from the University of California, Berkeley, USA. Huey is an avid basketball player and enjoys golf.
본 연사의 발표는 S5. Contamination-free Manufacturing and CMP Technology(STS) 에서 볼 수 있습니다.