02-531-7800

Korean


Workforce Pavilion - Plasma & Etching Tutorial

Room 307, COEX Thursday, January 24
9:00am to 12:00pm

This tutorial is designed as basic course for new engineers who is working at etching technology related area. With the practical lecture from device makers, equipment suppliers and academia, you will learn the hottest issues and challenges in plasma & etching process and fundamental technologies as well.
 
  • 날짜: 2019년 1월 24일(목)
  • 시간: 09:00-12:00
  • 장소: 코엑스 3층 307호
  • 언어: 한국어 (동시통역은 제공되지 않습니다.)

 

등록비

 
SEMI 회원사
비회원사
학생
사전등록(1/16까지)
100,000 원
120,000 원
50,000 원
현장등록
120,000 원
150,000 원
80,000 원

 

아젠다

 
 
09:00-09:45
Plasma Etching Fundamentals for Memory Devices
 
 
 
09:45-10:00
Q&A / Break
 
 
10:00-10:45
Characteristics of ICP Source
 
 
 
10:45-11:00
Q&A / Break
 
 
11:00-11:45
Effect of Pulsed RF Plasma for Etch Application
 
 
 
11:45-12:00
Q&A
 
 
*상기일정은 사전 안내 없이 변경될 수 있습니다. 
Share page with AddThis