S2. Advanced Materials & Process Technology

Room 308, COEX Wednesday, January 31
1:00pm to 5:00pm

In this session, we will be able to share the most up-to-date research and development results in the field of Advanced Materials and Process Technology which are the key enablers of the future semiconductor devices. Many prominent authors from the academia and industries will cover various functional materials research area and semiconductor devices not only in the view point of the fundamental but also for the mass production. Especially, topics regarding material innovation for semiconductor application will be highlighted and technical challenges for mass production will be discussed. Excellent 8 presentations including 3 outstanding invited talks will be given and will cover the major technical issues and the leading edge solutions.


  • 행사명: S2. Advanced Materials & Process Technology
  • 날짜: 2018년 1월 31일 (수)
  • 시간: 13:00-17:00
  • 장소: 코엑스 3층 308호
  • 주제: Advanced Materials & Technologies for Future Semiconductor Devices 
  • 언어: 영어 (동시통역 제공되지 않음)
  • 후원imec



  • Si Bum Kim (MagnaChip Semiconductor)
  • DeokSin Kil (SK hynix)
  • Hyoungyoon Kim (DB HiTek)
  • Jae Sung Roh (Jusung Engineering)
  • Kiseon Park (SK Materials)
  • Hyun Chul Sohn (Yonsei University)
  • Gill Lee (Applied Materials)
  • Marco Lee (Lam Research Korea)
  • Jong Min Lee (Eugene Technology)
  • In Gon Lim (Digital Imaging Technology)
  • HanJin Lim (Samsung Electronics)
  • Ji Hyun Choi (Tokyo Electron Korea)



  SEMI 회원사 비회원사 학생
사전등록(1/24까지) 150,000 원 180,000 원 80,000 원
현장등록 180,000 원 200,000 원 100,000 원



     14:40-15:00 Break
    *상기일정은 사전 안내 없이 변경될 수 있습니다. 
    *발표자료는 연사동의를 받은 자료에 한하여 행사 이후 이메일로 다운로드 방법을 안내드립니다.
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