Akira Toriumi is a professor of Materials Engineering at The University of Tokyo, Japan. He received the B.S. degree in physics, the M.S. and Ph.D. degrees in applied physics from The University of Tokyo. He joined Research and Development Center of Toshiba Corporation and then he moved to the University of Tokyo in 2000. His research interests include materials science and technology of high-k dielectrics for both silicon and germanium FETs, and device physics and materials science of carbon-based devices and functional oxides. He has authored more than 400 refereed journal/conference publications, and several book chapters. He is a fellow of the Japan Society of Applied Physics and a fellow of the Institute of Electrical and Electronics Engineers.
본 연사의 발표는 S2. Advanced Materials & Process Technology(STS) 에서 볼 수 있습니다.