02-531-7800

Korean


High Brightness FIB : Fundamentals & Application

Room 301, COEX Friday, February 02
1:00pm to 5:00pm

 

  • 행사명: High Brightness FIB : Fundamentals & Application
  • 날짜: 2018년 2월 2일 (금)
  • 시간: 13:00-17:00
  • 장소: 코엑스 3층 301호
  • 언어: 영어, 한국어 (동시통역 제공되지 않음)
  • Organized by KAIST, SL Innovation
  • Supported by SEMI

 

Keynote Speakers

Principle of High Brightness Plasma Beam for FIB System
 
Application of Next Generation FIB System in Microelectronics Application
Prof. Ko DH, Yonsei University
 
Next Generation Focused Ion Beam Using High Density Plasma Beam
Prof. Chang HY, KAIST
 

 


Questions

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