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S4. Plasma Science and Etching Technology

Room 307, COEX Thursday, February 01
1:00pm to 5:30pm

These days the semiconductor business is expanding more rapidly since Big Data and AI (Artificial Intelligence) technologies need plenty of chips as well as processor chips. Two technologies become the most promising ones for the future industry and they will change fundamentally the industrial structure and our normal lives all over the world. The skyrocketing needs for memories makes all chip makers to focus on scale down current DRAM, VNAND new memories. In addition, the high performance processors needs also more scale downed logic chips. As the scaling down is continuing, dry etching technology will confront the process limit eventually so it is the right time to discuss about the new etch technologies for overcoming the limit in this annual SEMICON symposium.

We prepared deep and wide touching on the critical and key etch technologies like new Pulsed Etch, ALE (Atomic Layer Etch), Ultra-high Energy Ion Etch, very-Low Temp. Etch and Etch Simulation technologies. These are essential technologies for solving the scaling down issue and, furthermore, for Big Data and AI era. We invited the academia and industry expertise who can share the vision and solutions for next generation etching technologies- please join us to gain keen insight of future.

 

  • 행사명: S4. Plasma Science and Etching Technology
  • 날짜: 2018년 2월 1일 (목)
  • 시간: 13:00-17:30
  • 장소: 코엑스 3층 307호
  • 주제Novel Plasma Process Technologies for Next Generation Devices
  • 언어: 영어 (동시통역 제공되지 않음)
  • 후원imec

 

Committee

  • Jaesoung Kim (Dongbu HiTek)
  • Gyoungjin Min (Lam Research Korea)
  • Jongchul Park (Samsung Electronics)
  • Jong Won Shon (ASM Genitech)
  • Geun Young Yeom (Sungkyunkwan University)
  • Minsuk Lee (SK hynix)
  • IC Jang (Lam Research Korea)

 

등록하기

등록비

  SEMI 회원사 비회원사 학생
사전등록(1/24까지) 150,000 원 180,000 원 80,000 원
현장등록 180,000 원 200,000 원 100,000 원

 

    아젠다

     13:00-13:40
     
     
     13:40-14:10
     
     
     14:10-14:50
     
     
     14:50-15:20
     
     
     15:20-15:40
    Break
     
     
     15:40-16:00
     
     
     16:00-16:40
     
     
     16:40-17:10
     
     
     17:10-17:30
     
    *상기일정은 사전 안내 없이 변경될 수 있습니다. 
    *발표자료는 연사동의를 받은 자료에 한하여 행사 이후 이메일로 다운로드 방법을 안내드립니다.
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