02-531-7800

Korean


S1. Advanced Lithography

Room 307, COEX Wednesday, January 31
1:00pm to 6:00pm

Advanced Lithography session of the STS 2017 will offer the opportunities to review the latest trends in the mainstream lithography technologies under the theme of "EUV High Volume Manufacturing and Beyond".

Recently there are a lot of progresses achieved in EUV and as a result EUV is getting considered as a manufacturing means more seriously than before. For the sake of the solid migration to the manufacturing phase, the readiness of each component of EUV will be reviewed during this meeting including overview, exposure tools, optics, material, mask, and process by the prominent leading figures of the corresponding area. In addition, the next generation EUV technologies like high-NA EUV and EUV double pattering will be discussed to disclose the potential issues and to prepare collaboratively throughout the industry.

 

  • 행사명: S1. Advanced Lithography
  • 날짜: 2018년 1월 31일 (수)
  • 시간: 13:00-18:00
  • 장소: 코엑스 3층 307호
  • 주제: EUV High Volume Manufacturing and Beyond
  • 언어: 영어 (동시통역 제공되지 않음)
  • 후원imec

 

Committee

  • Shangwon Kim (Dongbu HiTek)
  • Seong-Sue Kim (Samsung Electronics)
  • Jaehyun Kim (Dongjin Semichem)
  • Hong Seok Kim (Toppan Photomasks Korea)
  • Chang-Nam Ahn (ASML Korea)
  • Hye-Keun Oh (Hanyang University)
  • Changmoon Lim (SK hynix)
  • Jaesung Choi (ASML Korea)

 

등록하기

등록비

  SEMI 회원사 비회원사 학생
사전등록(1/24까지) 150,000 원 180,000 원 80,000 원
현장등록 180,000 원 200,000 원 100,000 원

 

    아젠다

     13:00-13:40
     
     
     13:40-14:20
    TBD
    Philippe Leray, Imec
     
     
     14:20-14:40
    TBD
    Andrew Grenville, Inpria
     
     
     14:40-15:00
     
     
     15:00-15:20
    Break
     
     
     15:20-16:00
     
     
     16:00-16:20
     
     
     16:20-16:40
     
     
     16:40-17:00
    Break
     
     
     17:00-17:20
     
     
     17:20-17:40
     
     
     17:40-18:00
     
    *상기일정은 사전 안내 없이 변경될 수 있습니다. 
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