Yusuke Oniki

Ph.D. / Researcher

Yusuke Oniki received the Ph.D. degree from electrical and electronic engineering department in Tokyo University of Agriculture and Technology, Tokyo, Japan, in 2012. He began his carrier researching and developing advanced logic devices at Taiwan Semiconductor Manufacturing Company Ltd. (TSMC) in Taiwan, where he was mainly engaged in the wet process development in the FEOL and MOL of 16, 10, 7, and 5 node FinFET technologies. Soon after starting the initial process development for 3nm technology node at TSMC, he joined Interuniversity Microelectronics Center (imec), Leuven, Belgium, in 2017 and belongs to the Surface and Interface Processing team, where he is continuing to explore wet cleaning and etching as well as dry etching process for advanced logic and memory devices.

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