Dr. Ryoung-han Kim is the group manager of Design/Design automation, OPC/RET, and Test-site/Tapeout group at IMEC. His scope at IMEC covers various R&D activities across logic and memory programs with focus on photo-lithography, OPC, mask technology, PDK/Design rule/design enablement, data preparation and design-technology co-optimization (DTCO). In addition, he covers operational projects such as design-to-tapeout and quality management internal imec, and serves as a reviewer of journals, a committee member of SPIE advanced lithography, and chairing multiple conference sessions externally.
Before joining IMEC, he was Sr. Manager of R&D at GLOBALFOUNDRIES that was spun-off from Advanced Micro Devices where he started his industrial career with early pioneering experience in multiple patterning and EUV lithography.
He received Ph.D. degree in Electrical engineering from Texas A&M University, College Station, Texas, USA with a focus on Integrated Optics, and B.S./M.S. from Yonsei University, Seoul, Korea.