Korea Research Institute of Standards and Science (KRISS)
Hyo-Chang Lee, Ph.D. has been a Research Scientist at Korea Research Institute of Standards and Science (KRISS) as a permanent position. He received a Ph.D. degree in plasma science field from Hanyang University, Seoul, Republic of Korea.
Before joining KRISS, he was lecture professor, research professor, and research fellow at Hanyang University (2012-2015) and senior researcher at Etch Technology Team, Memory Division, Samsung Electronics (2015-2016).
At KRISS, he is involved in experimental and theoretical studies of the industrial radio-frequency (RF) plasmas and development of the plasma diagnostic tools and plasma sources. He is a senior member of IEEE. He has published over sixty scientific papers including Applied Physics Reviews.